Electronic-grade silicon wafers are commonly used in integrated circuit or chip manufacturing, with a wafer diameter of 12 inches and an average surface density of approximately 1806. 37g/m2; this dataset includes major primary and auxiliary materials, energy, atmospheric emissions, and waste from the production process; infrastructure such as manufacturing of production equipment and construction of facilities is not included within the system boundary of the dataset; the life cycle inventory is compiled from data obtained from multiple sources; the data on raw and auxiliary materials, energy, and various emissions for the wafer foundry process are extrapolated and estimated based on 4-inch wafer foundry production; wafer manufacturing processes include polished wafer production and wafer contract processing steps; silicon polished wafer production includes monocrystalline pulling, slicing and grinding, and polishing; wafer contract processing includes wafer cleaning, end diffusion, photolithography, oxidation, and etching. , main processes such as thin film deposition, sintering, and metallization.