Electronic-grade silicon wafers are commonly used in integrated circuit or chip manufacturing, with an average areal density of approximately 1774. 21g/m2; if you cannot specify the exact size of the wafer, you can use this dataset, which is a weighted average of the following: "Wafer, 12-inch, for integrated circuits" and "Wafer, 8-inch, for integrated circuits". For detailed technical specifications, system boundaries, and other descriptive information, please refer to the production datasets for wafers of respective sizes. Infrastructure such as manufacturing equipment and facility construction is not included within the system boundary of this dataset. Raw materials, auxiliary materials, energy consumption, and various emissions associated with the wafer foundry process are extrapolated from 4-inch wafer foundry production estimates. Wafer manufacturing processes include polishing wafer production. Production and wafer foundry steps; the wafer manufacturing process includes polished wafer production and wafer foundry steps. The production of silicon polished wafers includes monocrystalline pulling, slicing and grinding, and polishing; the wafer foundry process includes major steps such as wafer cleaning, end diffusion, photolithography, oxidation, etching, thin film deposition, sintering, and metallization.