Cradle to Consumer
Identity ID
bd9739f1-19a0-4b00-983b-d86e53d3563c
Materials
Associated ID
d2203406-2f95-47ab-8db5-fd2c9b9b438a
Included activities starts
Included activities ends
Description
This dataset is a market dataset, representing the consumption market of the region; the dataset includes the transport of the product from the gate to the consumer end, and the transport service is calculated according to the transport situation of this product in this region. Trichlorosilane is widely used in fields such as semiconductor materials, photovoltaics, organosilicon synthesis and optical fibre material preparation; Trichlorosilane is modelled as a pure substance; when modelling this substance the user needs to add a solvent of their choice in the model; the dataset contains the main raw and auxiliary materials, energy, atmospheric emissions, wastewater and solid waste of the production process, in which the preliminary treatment of wastewater in the auxiliary units and the waste gas treatment process are included within the dataset boundary, and infrastructure such as the manufacture of production equipment and the construction of plant buildings is not included within the dataset boundary; the data inventory is formed by merging data from multiple sources; the production activities of this product include hydrogen chloride synthesis, hydrogen chloride drying, silicon powder drying, trichlorosilane synthesis, gas-solid separation, pressure swing adsorption and purification.
Activity Description
The production activities of this product include hydrogen chloride synthesis, hydrogen chloride drying, silicon powder drying, trichlorosilane synthesis, gas-solid separation, pressure swing adsorption, purification and other processes.
Process Description
Trichlorosilane has the chemical formula SiHCl3 and CAS number 10025-78-2. At ambient temperature and pressure, it is a colorless, transparent, volatile liquid with a strong pungent odor, a boiling point of approximately 31.8°C, and a density greater than that of water. It is readily soluble in organic solvents such as benzene, diethyl ether, and carbon tetrachloride. It reacts violently with water to produce silicic acid, hydrogen chloride, and hydrogen while releasing substantial heat and may ignite. It is chemically reactive, strongly reducing, and corrosive; it is readily oxidized by oxygen at ambient temperature and decomposes at high temperatures. Trichlorosilane is a key intermediate in organosilicon synthesis and semiconductor-material production. It is mainly used to produce high-purity silicon and polysilicon for the semiconductor and photovoltaic industries and to manufacture silane coupling agents, silicone oils, silicone rubber, and other organosilicon products. It is also used as a dopant in optical-fiber preform production, in epitaxial thin-film deposition, and as a reducing agent for metal chlorides.
Time period
2022
2026
Geography
China,Guangxi Zhuang Autonomous Region
Macroeconomic value
Business-as-Usual
Data validation
Yes
Technology
Current Technology
Technology comment
The hydrochlorination method is the mainstream industrial technology for the production of trichlorosilane. It is an improved front-end method of the Siemens method. It occupies an absolutely dominant position in the domestic trichlorosilane market and accounts for more than 99% of the domestic industrialized production capacity. This data set represents this mainstream technology: the combustion reaction of chlorine and hydrogen generates hydrogen chloride. The synthesized hydrogen chloride enters the furnace from the bottom of the trichlorosilane synthesis furnace. The reaction is initiated by an electrically conductive wire. Silicon powder reacts with hydrogen chloride to generate a mixed gas of trichlorosilane and silicon tetrachloride. The generated hydrogen is reused for hydrogen chloride synthesis. After the reaction, trichlorosilane and silicon tetrachloride are obtained through gas-solid separation, pressure swing adsorption, purification and other operations. The core reaction chemical equation of this process is: Si+3HCl→SiHCl3+H2; Si+4HCl→SiCl4+2H2.