Cradle to Gate
Identity ID
cda7f7ba-7cc2-4802-8728-6c4c62bad5e0
Materials
Associated ID
8c2b2ba7-acfe-48e6-8b29-19b9e4317f2f
Included activities starts
Included activities ends
Description
Zinc oxide planar targets are commonly used in optoelectronic and semiconductor fields; this dataset includes major raw materials, auxiliary materials, energy consumption, atmospheric emissions, water discharges, and waste from the production process. Infrastructure such as manufacturing of production equipment and construction of facilities are not included within the system boundary of the dataset. Data are sourced from literature. The manufacturing process of zinc oxide planar targets includes vacuum distillation reduction, smelting, ingot casting, hot rolling, hot isostatic pressing, machining, inspection, cleaning, and polishing.
Activity Description
The production process of zinc oxide planar target materials includes vacuum distillation reduction, melting, ingot casting, hot rolling, hot isostatic pressing, machining, inspection, cleaning, and polishing.
Process Description
Planar targets are key materials in thin film deposition processes, primarily used in physical vapor deposition techniques such as sputtering deposition, and are typically shaped as circular disks or rectangular plates. Zinc oxide targets refer to those composed mainly of zinc oxide (ZnO), commonly used in optoelectronic and semiconductor fields.
Time period
2021
2026
Geography
China
Macroeconomic value
Business-as-Usual
Data validation
Yes
Technology
Current Technology
Technology comment
The production process of zinc oxide planar target materials includes vacuum distillation reduction, melting, ingot casting, hot rolling, hot isostatic pressing, machining, inspection, cleaning, and polishing.