Cradle to Gate
Identity ID
e1708bed-2956-47eb-b6e7-0641330d2c36
Materials
Associated ID
0e87b7c6-989d-49b3-ab85-d9d8a5ce81c2
Included activities starts
Included activities ends
Description
Copper-sodium planar targets are key materials in the thin-film physical vapor deposition process; this dataset includes major raw materials, auxiliary materials, energy consumption, atmospheric emissions, water emissions, and waste from the production process. Infrastructure such as production equipment manufacturing and facility construction are not included within the system boundary of the dataset; data are sourced from literature. The manufacturing process of copper-sodium planar targets includes procedures such as vacuum distillation reduction, melting, ingot casting, hot rolling, hot isostatic pressing, machining, inspection, cleaning, and polishing.
Activity Description
The production process of copper-sodium planar target materials includes vacuum distillation reduction, smelting, ingot casting, hot rolling, hot isostatic pressing, machining, inspection, cleaning, polishing, and other process steps.
Process Description
Planar targets are key materials in thin film deposition processes, primarily used in physical vapor deposition techniques such as sputtering, and are typically shaped as circular disks or rectangular plates. The main components of copper-sodium planar targets are copper ions and sodium ions.
Time period
2021
2026
Geography
China
Macroeconomic value
Business-as-Usual
Data validation
Yes
Technology
Current Technology
Technology comment
The production process of copper-sodium planar target materials includes vacuum distillation reduction, smelting, ingot casting, hot rolling, hot isostatic pressing, machining, inspection, cleaning, polishing, and other process steps.